Hwaseong-si, South Korea

Yu-Ra Kim


Average Co-Inventor Count = 5.1

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Seoul, KR (2015)
  • Hwaseong-si, KR (2016)

Company Filing History:


Years Active: 2015-2016

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2 patents (USPTO):Explore Patents

Title: Innovations by Yu-Ra Kim in Semiconductor Manufacturing

Introduction

Yu-Ra Kim is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor manufacturing, holding 2 patents that showcase his expertise and innovative approach.

Latest Patents

His latest patents include methods of manufacturing a semiconductor device. In this method, an isolation layer pattern is formed on a substrate to define first and second active fins. An anti-reflective coating (ARC) layer is formed on the isolation layer pattern to at least partially cover the sidewalls of the first and second active fins. The level of the top surface of the ARC layer is equal to or less than, and equal to or greater than half of those of the first and second active fins. A photoresist layer is formed on the first and second active fins and the ARC layer. A portion of the photoresist layer is removed to form a photoresist pattern covering the first active fin and exposing the second active fin. A portion of the ARC layer under the removed portion of the photoresist layer is removed to form an ARC layer pattern. Impurities are implanted into the exposed second active fin to form an impurity region. Another patent focuses on methods of forming layer patterns of a semiconductor device. This method includes forming an ARC layer on an etching object layer, where the ARC layer includes a polymer having an imide group. A photoresist pattern is formed on the ARC layer, and portions of the ARC layer exposed by the photoresist pattern are wet etched to form an ARC layer pattern. The etching object layer is then etched using the photoresist pattern as an etch mask to form the layer pattern.

Career Highlights

Yu-Ra Kim is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to be at the forefront of semiconductor innovation, contributing to advancements that are crucial for modern electronics.

Collaborations

He has collaborated with notable coworkers, including Tae-sun Kim and Tae-Hwan Oh, further enhancing the innovative environment at Samsung Electronics.

Conclusion

Yu-Ra Kim's contributions to semiconductor manufacturing through his patents reflect his dedication to innovation in technology. His work continues to influence the industry and pave the way for future advancements.

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