Yu-Ning Cheng

Title: Innovations of Yu-Ning Cheng in Semiconductor Technology

Introduction

Yu-Ning Cheng is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative designs that enhance etching processes in manufacturing.

Latest Patents

Yu-Ning Cheng holds a patent for a "Cantilever with etch chamber flow design." This invention features a cantilever designed for gas flow direction control, which supports an electrode housing bowl in an associated etch process chamber. The cantilever can have a cross-section that is circular, elliptical, or airfoil shaped. This unique design induces the flow of gas and etch products within the chamber around the cantilever, effectively reducing turbulence around the edge of a wafer.

Career Highlights

Yu-Ning Cheng is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work focuses on improving the efficiency and effectiveness of etching processes, which are critical in semiconductor fabrication.

Collaborations

Some of his notable coworkers include Chien-Liang Chen and Chien-Yu Wang, who contribute to the collaborative efforts in advancing semiconductor technologies.

Conclusion

Yu-Ning Cheng's innovative contributions, particularly his patented cantilever design, play a crucial role in enhancing semiconductor manufacturing processes. His work exemplifies the importance of innovation in the ever-evolving field of technology.