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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12400834 B1

PDFFull Text
Date of Patent:
Aug. 26, 2025

Filed:

Aug. 18, 2021

Cantilever with etch chamber flow design

Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Chien-Liang Chen, New Taipei, TW;

Chien-Yu Wang, Hsinchu, TW;

Wei-Da Chen, Hsinchu County, TW;

Yu-Ning Cheng, Hsinchu, TW;

Shih-Tsung Chen, New Taipei, TW;

Yung-Yao Lee, Hsinchu County, TW;

Assignee:

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;

Attorney:

Lippes Mathias LLP

Primary Examiner:

Parviz Hassanzadeh

Assistant Examiner:

Michelle Crowell

Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01J 37/32 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32449 (2013.01); H01J 37/32568 (2013.01); H01J 37/32834 (2013.01); H01L 21/68792 (2013.01); H01J 2237/334 (2013.01);
Abstract

A cantilever for gas flow direction control configured to support an electrode housing bowl in an associated etch process chamber. The cantilever may have a cross-section that is circular, elliptical, or airfoil shaped. The shape of the cantilever induces the flow of gas and etch products within the chamber around the cantilever, reducing turbulence around the edge of a wafer.

Find Patent Forward Citations

Chen, Chien-Liang. (2025). Cantilever with etch chamber flow design (U.S. Patent No. 12400834). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12400834

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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