Yu-Jen Shen

Title: Innovations by Yu-Jen Shen in Semiconductor Technology

Introduction

Yu-Jen Shen is a prominent inventor based in Hsin-Chu, Taiwan, known for his significant contributions to semiconductor technology. With a total of six patents to his name, he has made remarkable advancements in methods for forming semiconductor devices.

Latest Patents

One of his latest patents is focused on methods of forming semiconductor devices. In this embodiment, the method includes forming a fin extending from a substrate, creating a first gate mask over the fin with a specific width, and a second gate mask with a greater width. The process involves depositing a first filling layer over both gate masks, followed by a second filling layer. A chemical mechanical polish (CMP) process is then performed to expose the first filling layer, which is further planarized using an etch-back process.

Another notable patent by Yu-Jen Shen is the replacement gate process for semiconductor devices. This method includes providing a precursor with a substrate and gate stacks, where each gate stack consists of an electrode layer and hard mask layers. The process involves depositing a dielectric layer, performing a CMP process to partially remove the dielectric layer, and executing an etching process to expose the first hard mask layer. A second CMP process is then conducted to remove the first hard mask layer.

Career Highlights

Yu-Jen Shen works at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative approaches have contributed to the advancement of semiconductor manufacturing techniques, enhancing the efficiency and performance of electronic devices.

Collaborations

Yu-Jen Shen has collaborated with notable colleagues, including Ying-Ho Chen and Yung-Cheng Lu, who have also contributed to advancements in semiconductor technology.

Conclusion

Yu-Jen Shen's work in semiconductor technology showcases his innovative spirit and dedication to advancing the field. His patents reflect significant contributions that continue to influence the industry.