Hsinchu, Taiwan

Yu-Hsun Chiang

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Co., Ltd.. Active years: 2026.


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Yu-Hsun Chiang

Introduction

Yu-Hsun Chiang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of plasma processing. His work focuses on improving the efficiency and reliability of wafer fabrication processes.

Latest Patents

Yu-Hsun Chiang holds a patent titled "Systems and methods for determining residual compounds in plasma process." This patent presents a system and method for predicting wafer fabrication defects that may arise during plasma processing in a plasma processing chamber. The innovative approach involves processing electromagnetic signals emitted from residual compounds that are peeled from the chamber walls during the plasma processing of wafers. This method allows for the indirect determination of the likelihood that wafers are incurring fabrication processing defects during the plasma processing.

Career Highlights

Yu-Hsun Chiang is currently employed at Taiwan Semiconductor Manufacturing Company, a leading firm in the semiconductor industry. His expertise in plasma processing has positioned him as a valuable asset to the company, contributing to advancements in wafer fabrication technology.

Collaborations

Some of his notable coworkers include Chen-Tai Chen and Jing-Ran Lin. Their collaborative efforts in research and development have further enhanced the innovative capabilities of their team.

Conclusion

Yu-Hsun Chiang's contributions to the field of semiconductor manufacturing through his innovative patent demonstrate his commitment to advancing technology in wafer fabrication. His work continues to influence the industry positively.

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