Yu Hsi Tang

Title: Innovations by Yu Hsi Tang in Semiconductor Processing

Introduction

Yu Hsi Tang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor processing, particularly through his innovative patent that addresses the challenges of gas flow uniformity in etch tools.

Latest Patents

Yu Hsi Tang holds a patent for a semiconductor processing tool and methods of operation. This patent provides techniques and apparatuses aimed at improving the uniformity of gas flow across a semiconductor substrate in an etch tool. The etch tool features an exhaust port located at the bottom center of the chamber, along with a flow-control subsystem that includes an impeller and a thermal component. By varying the rotational velocity of the impeller and the amount of heat transferred from the thermal component, the uniformity of gas flow can be enhanced. This innovation leads to an increased etching rate and reduces contamination defects, ultimately improving the yield of semiconductor products.

Career Highlights

Yu Hsi Tang is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work focuses on enhancing semiconductor manufacturing processes, which are crucial for the production of high-quality electronic components.

Collaborations

Some of his notable coworkers include Liang Yu Chen and Yu-Chi Lin, who contribute to the collaborative efforts in advancing semiconductor technologies.

Conclusion

Yu Hsi Tang's innovative work in semiconductor processing exemplifies the importance of advancements in technology for improving manufacturing efficiency and product quality. His contributions are vital to the ongoing evolution of the semiconductor industry.