Company Filing History:
Years Active: 1999
Title: Innovations by Yu-Hao Chen in Semiconductor Technology
Introduction
Yu-Hao Chen is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of chemical vapor deposition processes. His innovative work has led to advancements that enhance the manufacturing of semiconductor devices.
Latest Patents
Yu-Hao Chen holds a patent for a multi-step high density plasma chemical vapor deposition process. This method is designed for depositing dielectric material into gaps between wiring lines during the formation of semiconductor devices. The process involves the deposition of three oxide layers using high density plasma chemical vapor deposition (HDPCVD). The first step is conducted while keeping the substrate unbiased, forming an oxide layer over the lines and in the gap. The second step, where the substrate is biased, deposits a second oxide layer over the first, resulting in some etching and removal of a portion of the first oxide layer. The third step is executed at a greater etch and sputtering rate to complete the filling of the gap with dielectric material. This innovative approach allows for the filling of gaps without forming voids, even in high aspect ratio scenarios.
Career Highlights
Yu-Hao Chen is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work has been instrumental in developing processes that improve the efficiency and reliability of semiconductor manufacturing.
Collaborations
Yu-Hao Chen has collaborated with several talented individuals in his field, including Chih-Chien Liu and Kuen-Jian Chen. These collaborations have fostered an environment of innovation and have contributed to the success of their projects.
Conclusion
Yu-Hao Chen's contributions to semiconductor technology through his innovative patent demonstrate his expertise and commitment to advancing the industry. His work continues to influence the development of efficient manufacturing processes in semiconductor devices.