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For the Inventor, By the Inventor

Taipei, Taiwan

Yu-Fang Wang

This inventor holds 4 USPTO granted patents. Top assignee: Hannstar Display Corporation. Active years: 2003-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yu-Fang Wang. Retrieved from https://idiyas.com/inventor/yu-fang-wang-e430pbsp

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4

% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 3

Forward Citations = 18(Granted Patents)


Location History:

  • Taoyuan Hsien, TW (2003)
  • Taoyuan, TW (2004 - 2005)
  • Taipei, TW (2010)

Company Filing History:

goldMedal4 out of 658 
 
Hannstar Display Corporation
 patents

Years Active: 2003-2010

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4 patents (USPTO):Explore Patents
1. 7746443 - Method of utilizing dual-layer photoresist to form black matrixes and spacers on a control circuit substrate (2010-06-29),
2. 6958792 - Method of utilizing dual-layer photoresist to form black matrixes and spacers on a control circuit substrate (2005-10-25),
3. 6749975 - Method of utilizing color photoresist to form black matrix and spacers on a control circuit substrate (2004-06-15),
4. 6558971 - Method for manufacturing an LCD panel (2003-05-06),

Title: Yu-Fang Wang: Innovator in Photoresist Technology

Introduction

Yu-Fang Wang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of photoresist technology, holding a total of 4 patents. His work focuses on innovative methods that enhance the manufacturing processes in display technology.

Latest Patents

One of Yu-Fang Wang's latest patents is a method of utilizing dual-layer photoresist to form black matrixes and spacers on a control circuit substrate. This method involves a dual-layer photoresist that includes a layer of black resin and a layer of transparent photoresist. The black resin, which has an optical density greater than three, is primarily used to achieve the effect of a black matrix. The transparent photoresist is essential for maintaining the required cell gap between two transparent substrates.

Career Highlights

Yu-Fang Wang is currently employed at Hannstar Display Corporation, where he continues to innovate in the field of display technology. His expertise in photoresist applications has positioned him as a key player in the industry.

Collaborations

Some of his notable coworkers include Chih-Chieh Lan and Hung-Yi Hung, who collaborate with him on various projects within the company.

Conclusion

Yu-Fang Wang's contributions to photoresist technology are noteworthy, and his innovative methods continue to impact the display manufacturing industry. His work exemplifies the importance of advancements in technology for enhancing product quality and efficiency.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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