The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2010
Filed:
Oct. 24, 2005
Applicants:
Chih-chieh Lan, Taipei, TW;
Hung-yi Hung, Taipei, TW;
Yu-fang Wang, Taipei, TW;
Inventors:
Assignee:
HannStar Display Corporation, Taipei, Taiwan, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/13 (2006.01); G02F 1/136 (2006.01); G02F 1/1335 (2006.01); G02F 1/1339 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of utilizing dual-layer photoresist to form black matrixes and spacers on a control circuit substrate is provided. The dual-layer photoresist includes a layer of black resin and a layer of transparent photoresist. The black resin, having an optical density greater than three, is mainly used to achieve the effect of black matrix. The transparent photoresist is mainly used to satisfy the needed cell gap between two transparent substrates.