Yu De Liou

Title: Innovations of Yu De Liou

Introduction

Yu De Liou is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patents. With a total of 3 patents, his work has had a notable impact on the industry.

Latest Patents

One of Yu De Liou's latest patents is titled "Control of dynamic gas lock flow inlets of an intermediate focus cap." This control system incorporates multiple pressure sensors to detect pressure in various dynamic gas lock (DGL) nozzle control regions. Each region consists of one or more DGL nozzles, and the system includes mass flow controllers (MFCs) to regulate flow velocity. The controller selectively adjusts the flow velocities based on the pressures detected by the sensors.

Another significant patent is for a "Module vessel with scrubber gutters sized to prevent overflow." This extreme ultraviolet (EUV) source features a module vessel equipped with a scrubber system that includes multiple gutters. The design ensures that the second gutter is lower than the first, with a larger unit volume, effectively preventing overflow.

Career Highlights

Yu De Liou is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to develop and refine his innovative ideas, contributing to advancements in technology.

Collaborations

Yu has collaborated with notable coworkers, including Chun-Kai Chang and Yu Sheng Chiang. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Yu De Liou's contributions to the field of semiconductor technology through his patents demonstrate his innovative spirit and dedication to advancing the industry. His work continues to influence the development of new technologies in the semiconductor sector.