Yu-Chin Cheng

Title: Yu-Chin Cheng: Innovator in Silicon Nitride Removal Technology

Introduction

Yu-Chin Cheng is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the removal of silicon nitride materials. His innovative methods have the potential to enhance the efficiency and effectiveness of semiconductor fabrication processes.

Latest Patents

Yu-Chin Cheng holds a patent for a method for removing nitride material. This method involves several steps, including providing a substrate with a gate structure and forming a silicon nitride hard mask on top of it. The process includes a first removal step using a first phosphoric acid (HPO) solution to eliminate a portion of the silicon nitride hard mask. A second removal step follows, utilizing a second phosphoric acid solution to remove any remaining silicon nitride hard mask. Notably, both removal steps are performed in-situ, with the second solution being at a lower temperature than the first.

Career Highlights

Yu-Chin Cheng is associated with United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to develop and refine his innovative techniques, contributing to advancements in semiconductor technology.

Collaborations

Some of Yu-Chin Cheng's coworkers include Chi-Sheng Chen and Shin-Chi Chen. Their collaboration in the field of semiconductor research has fostered an environment of innovation and development.

Conclusion

Yu-Chin Cheng's contributions to the semiconductor industry, particularly through his patented method for removing silicon nitride materials, highlight his role as an influential inventor. His work continues to impact the efficiency of semiconductor manufacturing processes.