Hsin Tien, Taiwan

Yu-Chang Sun


Average Co-Inventor Count = 6.9

ph-index = 2

Forward Citations = 109(Granted Patents)


Location History:

  • Sindian, TW (2005)
  • Hsintien, TW (2006 - 2009)

Company Filing History:


Years Active: 2005-2009

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3 patents (USPTO):Explore Patents

Title: Innovations of Yu-Chang Sun in TFT Electrode Manufacturing

Introduction

Yu-Chang Sun is a notable inventor based in Hsin Tien, Taiwan. He has made significant contributions to the field of thin-film transistors (TFT) through his innovative patents. With a total of 3 patents, his work focuses on manufacturing methods that enhance the performance and reliability of TFT electrodes.

Latest Patents

One of Yu-Chang Sun's latest patents is a manufacturing method for a TFT electrode designed to prevent metal layer diffusion. This method involves several steps, including providing a substrate, forming a first metal layer, and performing photolithography and etching processes to create a gate electrode. Additionally, a transparent conducting electrode is formed to cover the gate electrode, which helps prevent metal ion diffusion during fabrication. Another significant patent is the structure of a TFT electrode that also aims to prevent metal diffusion during the fabrication process. This invention reduces the risk of contamination in chemical vapor deposition processes by using a transparent pixel electrode as a barrier layer.

Career Highlights

Throughout his career, Yu-Chang Sun has worked with prominent organizations such as the Industrial Technology Research Institute and the Taiwan TFT LCD Association. His experience in these institutions has allowed him to develop and refine his innovative techniques in TFT manufacturing.

Collaborations

Yu-Chang Sun has collaborated with notable colleagues, including Chi-Shen Lee and Chai-Yuan Sheu. These partnerships have contributed to the advancement of technology in the field of TFTs.

Conclusion

Yu-Chang Sun's contributions to the field of TFT manufacturing through his innovative patents demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry and pave the way for future innovations.

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