Machida, Japan

Yozo Ikedo


Average Co-Inventor Count = 2.0

ph-index = 3

Forward Citations = 1,123(Granted Patents)


Location History:

  • Tama, JP (2006 - 2010)
  • Machida, JP (2018 - 2023)

Company Filing History:


Years Active: 2006-2023

Loading Chart...
7 patents (USPTO):Explore Patents

Title: Yozo Ikedo: Innovator in Film-Forming Technology

Introduction

Yozo Ikedo is a prominent inventor based in Machida, Japan. He has made significant contributions to the field of film-forming technology, holding a total of 7 patents. His innovative work has advanced the methods and devices used in film formation, showcasing his expertise and creativity.

Latest Patents

Ikedo's latest patents include a film-forming material mixed-gas forming device and a film forming apparatus. The film-forming material mixed-gas forming device features a supply unit that delivers a film-forming material in liquid form at a predetermined flow rate, along with a carrier gas supply unit. This device also includes a main vaporization unit that vaporizes the film-forming material and an auxiliary vaporization unit designed to capture and vaporize droplets of the film-forming material. The film forming apparatus consists of a chamber with a processing space, a stage for substrate placement, and a gas supply tube that ejects material gas in a specific direction.

Career Highlights

Throughout his career, Ikedo has worked with notable companies such as ASM IP Holding B.V. and ASM Japan K.K. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in the industry.

Collaborations

Ikedo has collaborated with talented individuals, including Takuya Suguri and Naoto Tsuji. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Yozo Ikedo's contributions to film-forming technology are noteworthy, and his patents reflect his dedication to innovation. His work continues to influence the industry and inspire future advancements in the field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…