Pyeongtaek, South Korea

Younguk Han

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignees: Solmics Co., Ltd., Solmics Co., Ltd.. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Younguk Han. Retrieved from https://idiyas.com/inventor/younguk-han

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: Younguk Han: Innovator in Ceramic Components for Plasma Etching

Introduction

Younguk Han is a notable inventor based in Pyeongtaek-si, South Korea. He has made significant contributions to the field of plasma etching technology. His innovative work focuses on ceramic components that enhance the efficiency and effectiveness of plasma etching apparatuses.

Latest Patents

Younguk Han holds a patent for a ceramic component and plasma etching apparatus comprising the same. This patent describes a ceramic component that includes a base material and a composite material in contact with the base material. The resistivity of the ceramic component ranges from 10Ω·cm to 20Ω·cm. The base material consists of a first boron carbide-based material, while the composite material includes at least one selected from a second boron carbide-based material, a carbon-based material, and combinations thereof.

Career Highlights

Younguk Han is currently employed at Solmics Co., Ltd., where he continues to develop innovative solutions in the field of plasma etching. His work has positioned him as a key player in advancing technology related to ceramic components.

Collaborations

He collaborates with talented coworkers, including Surgsic Hwang and Junrok Oh, who contribute to the innovative environment at Solmics Co., Ltd.

Conclusion

Younguk Han's contributions to the field of plasma etching through his innovative ceramic components demonstrate his commitment to advancing technology. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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