This inventor holds 1 USPTO granted patent. Top assignees: Chempole Co., Ltd., Olas Co., Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 2 
1 out of 1 Years Active: 2026
Title: Youngsun Kim: Inventor in Photosensitive Polymer Technology.
Introduction
Youngsun Kim is an inventor associated with Hwaseong, South Korea. Her patent work concerns photosensitive polymers and resist compositions, and the provided information lists 1 patent.
Latest Patents
Kim’s listed patent, “Photosensitive Polymer and Resist Composition Having the Same,” describes a photosensitive polymer containing a repeating unit derived from a vinyl heteroaromatic compound, along with a resist composition that includes the polymer. The disclosed chemical formulas specify that R and R′ are hydrogen or methyl groups, X is a carbon, sulfur, or nitrogen atom, and n is 1 or 2.
Career Highlights
The provided career information associates Kim with Olas Co., Ltd. and Chempole Co., Ltd. Her listed patent reflects work on polymer materials and resist compositions.
Collaborations
The provided information names Sang Jun Choi and Jaebuem Oh as Kim’s coworkers.
Conclusion
Youngsun Kim’s listed invention focuses on a photosensitive polymer and its use in resist compositions, connecting her patent record with materials research and development.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile