The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2026
Filed:
Feb. 14, 2022
Applicants:
Olas Co., Ltd., Cheonan-si, KR;
Chempole Co., Ltd., Suwon-si, KR;
Inventors:
Assignees:
OLAS CO., LTD., Cheonan-si, KR;
CHEMPOLE CO., LTD., Suwon-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 226/06 (2006.01); C08F 212/06 (2006.01); C08F 220/06 (2006.01); C08F 224/00 (2006.01); G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
C08F 226/06 (2013.01); C08F 212/06 (2013.01); C08F 220/06 (2013.01); C08F 224/00 (2013.01); G03F 7/0045 (2013.01); G03F 7/0392 (2013.01); G03F 7/11 (2013.01); G03F 7/2006 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01);
Abstract
Disclosed are a photosensitive polymer including a repeating unit of Chemical Formula 1 or Chemical Formula 2 derived from a vinyl heteroaromatic compound and a resist composition including the same. In Chemical Formula 1 or 2, Rand Rare hydrogen or a methyl group, X is a carbon, sulfur, or a nitrogen atom, and n is 1 or 2.
Choi, Sang. (2026). Photosensitive polymer and resist composition having the same (U.S. Patent No. 12692335). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12692335
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile