This inventor holds 1 USPTO granted patent. Top assignees: Chempole Co., Ltd., Olas Co., Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 2 
1 out of 1 Years Active: 2026
Title: Jaebuem Oh: Inventor in Photosensitive Polymer Technology
Introduction
Jaebuem Oh is an inventor based in Daejeon, South Korea. His patent work concerns photosensitive polymers and resist compositions, materials used in processes such as photolithography.
Latest Patents
Oh is associated with 1 patent: “Photosensitive Polymer and Resist Composition Having the Same.” The patent describes a photosensitive polymer containing a repeating unit derived from a vinyl heteroaromatic compound, along with a resist composition that includes the polymer. Its chemical formulas specify that R and R′ are hydrogen or methyl groups, X is a carbon, sulfur, or nitrogen atom, and n is 1 or 2.
Career Highlights
Oh has been associated with Olas Co., Ltd. and Chempole Co., Ltd. His listed patent reflects work on polymer materials designed for photosensitive resist applications.
Collaborations
Sang Jun Choi and Youngsun Kim are listed as Oh’s coworkers. Their shared professional context connects them to the same broader innovation and patent landscape.
Conclusion
Jaebuem Oh’s patent activity centers on photosensitive polymer and resist-composition technology, with professional associations at Olas Co., Ltd. and Chempole Co., Ltd.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile