Hwaseong, South Korea

Youngsu Kim

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Youngsu Kim. Retrieved from https://idiyas.com/inventor/youngsu-kim-pwmj01ju

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Youngsu Kim - Innovator in Semiconductor Manufacturing

Introduction

Youngsu Kim is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent.

Latest Patents

Youngsu Kim holds a patent for a "Method of manufacturing semiconductor device substrate with crystal structure reformation regions." This method involves preparing an initial substrate that includes an edge region and a central region where circuit patterns are formed. The process includes forming a reforming region in the edge region of the initial substrate, grinding the substrate to create a semiconductor chip, and ensuring that the crystal structure of the reforming region differs from that of the initial substrate.

Career Highlights

Youngsu Kim is associated with Samsung Electronics Co., Ltd., a leading company in the electronics industry. His work has been instrumental in advancing semiconductor technology, which is crucial for modern electronic devices.

Collaborations

He has collaborated with notable colleagues, including Byoung-Soo Kwak and Sangwook Park, who have also contributed to the field of semiconductor manufacturing.

Conclusion

Youngsu Kim's innovative approach to semiconductor manufacturing exemplifies the importance of research and development in technology. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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