Youngjo Jin

Title: Youngjo Jin - Innovator in Substrate Processing Technology

Introduction

Youngjo Jin is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate processing, particularly in the area of atomic layer etching. His innovative approach has led to the development of a patented method that enhances the efficiency and stability of substrate processing.

Latest Patents

Youngjo Jin holds a patent for an "Apparatus and method for processing substrate." This invention provides a substrate processing method capable of stably performing atomic layer etching without damaging a process chamber. The method involves several steps, including providing a substrate with a target layer in a chamber, forming a first plasma using a chlorine-containing gas to reform the target layer, and subsequently forming a second plasma with an oxygen-containing gas to further reform the target layer. The process allows for the removal of portions of the target layer by repeating these steps, showcasing a sophisticated approach to substrate processing. He has 1 patent to his name.

Career Highlights

Youngjo Jin is associated with Semes Co., Ltd., a company known for its advancements in semiconductor manufacturing equipment. His work at Semes has positioned him as a key player in the development of innovative technologies that support the semiconductor industry.

Collaborations

Youngjo Jin collaborates with talented individuals such as Young Eun Jeon and Yun Sang Kim. Their combined expertise contributes to the ongoing advancements in substrate processing technologies.

Conclusion

Youngjo Jin's contributions to substrate processing technology reflect his dedication to innovation and excellence in the field. His patented methods are paving the way for more efficient and stable processes in semiconductor manufacturing.