Youngdon Chang

Title: Youngdon Chang: Innovator in Substrate Patterning Technology

Introduction

Youngdon Chang is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate patterning technology. His innovative approach has led to the development of a unique method that enhances the precision of patterning processes.

Latest Patents

Youngdon Chang holds a patent for a "Sidewall spacer patterning method using gas cluster ion beam." This method involves receiving a substrate with a patterned layer that defines a first mandrel pattern. A first material layer of a specific composition is conformally deposited over this mandrel pattern. The process includes partially removing the first material layer using a gas cluster ion beam etching process. This technique exposes the top surface of the mandrel pattern while retaining a portion of the material on the sidewalls. The method concludes with the selective removal of the mandrel pattern, leaving a second mandrel pattern that comprises the remaining material.

Career Highlights

Youngdon Chang is associated with Tel Epion Corporation, where he applies his expertise in substrate patterning. His work has been instrumental in advancing the company's technological capabilities. With a focus on innovation, he continues to contribute to the field through his research and development efforts.

Collaborations

Youngdon Chang collaborates with talented individuals such as Soo Doo Chae and Il-seok Song. Their combined efforts foster a creative environment that drives innovation within their projects.

Conclusion

Youngdon Chang's contributions to substrate patterning technology exemplify the impact of innovative thinking in the field. His patent and ongoing work at Tel Epion Corporation highlight his commitment to advancing technology.