Young Ki Han

Title: Young Ki Han: Innovator in Plasma Processing Technology

Introduction

Young Ki Han is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of plasma processing technology, holding a total of 4 patents. His innovative work focuses on improving the efficiency and reliability of substrate processing methods.

Latest Patents

Young Ki Han's latest patents include an "Apparatus for Plasma Processing and Method for Plasma Processing." This invention provides a substrate supporter that securely holds a substrate, such as a wafer, to remove impurities from its rear surface. The plasma processing apparatus features at least one arm and a supporting portion that extends toward the substrate seating position. This design reduces the likelihood of arc discharges compared to conventional dry etching, thereby increasing process yield and product reliability. Another notable patent is the "Apparatus and Method for Processing Substrate," which allows for individual plasma processing of the edge and rear regions of a substrate within a single chamber. This apparatus includes a reaction space chamber, a stage, a plasma shielding unit, and multiple supply pipes for gas distribution.

Career Highlights

Throughout his career, Young Ki Han has worked with notable companies such as Charm Engineering Co., Ltd. and Jusung Engineering Co., Ltd. His experience in these organizations has contributed to his expertise in plasma processing technologies.

Collaborations

Young Ki Han has collaborated with esteemed colleagues, including Jae Chul Choi and Hyoung Won Kim. Their joint efforts have further advanced the field of plasma processing.

Conclusion

Young Ki Han is a distinguished inventor whose work in plasma processing technology has led to significant advancements in the industry. His innovative patents and collaborations highlight his commitment to improving substrate processing methods.