Company Filing History:
Years Active: 2019-2020
Title: Innovations by Young Jung Lee
Introduction
Young Jung Lee is a notable inventor based in Chungcheongnam-do, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the treatment of silicon wafers. With a total of two patents to his name, Lee's work has implications for improving the performance and reliability of silicon-based devices.
Latest Patents
Lee's latest patents focus on methods for treating silicon wafers to enhance intrinsic gettering and gate oxide integrity yield. One of his key inventions is a method designed to recover the gate oxide integrity yield of a silicon wafer after rapid thermal anneal in an ambient atmosphere containing nitrogen gases, such as NH3 or N2. This process addresses the degradation of gate oxide integrity yield caused by the exposure of crystal defects and vacancies generated by the silicon nitride film during rapid thermal annealing. The innovative method involves stripping the silicon nitride layer, followed by wafer oxidation, and then stripping the silicon oxide layer to restore the gate oxide integrity yield.
Career Highlights
Young Jung Lee is currently employed at SunEdison Semiconductor Limited, where he continues to advance his research and development efforts in semiconductor technology. His work has been instrumental in enhancing the manufacturing processes of silicon wafers, contributing to the overall efficiency and effectiveness of semiconductor devices.
Collaborations
Lee has collaborated with notable colleagues, including Jae-Woo Ryu and Byung Chun Kim. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the semiconductor industry.
Conclusion
Young Jung Lee's contributions to the field of semiconductor technology through his innovative patents demonstrate his commitment to advancing the industry. His work not only addresses critical challenges in silicon wafer treatment but also paves the way for future advancements in semiconductor manufacturing.