This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: Young-ho Seo: Innovator in Plasma Processing Technology
Introduction
Young-ho Seo is a notable inventor based in Gyeonggi, South Korea. He has made significant contributions to the field of plasma processing technology, particularly through his innovative patent that addresses challenges in plasma etching apparatuses.
Latest Patents
Seo holds a patent for a "Plasma processing apparatus protected from discharges in association." This invention focuses on a plasma processing apparatus, such as a plasma etching apparatus, which is designed to prevent arcing to the gas distributor plate. This issue is often caused by secondary potentials generated by polymers that adhere to the gas distribution plate. The design features an electrically isolated gas distribution plate that does not possess any polarity. Additionally, the gas distribution plate can be made from an insulating material, enhancing its functionality. A support plate is also included, allowing for the gas distribution plate to be detachably coupled with the support plate, facilitating easier maintenance by enabling the removal of accumulated polymers during the plasma process.
Career Highlights
Young-ho Seo is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the field of plasma processing. His work has been instrumental in advancing the technology used in various electronic manufacturing processes.
Collaborations
Seo has collaborated with notable colleagues, including Chang-sik Kim and Jin-ho Park, who have contributed to his research and development efforts.
Conclusion
Young-ho Seo's contributions to plasma processing technology exemplify the innovative spirit of modern inventors. His patent not only addresses critical issues in the field but also enhances the efficiency of plasma processing apparatuses.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
