The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2000
Filed:
Oct. 24, 1997
Chang-sik Kim, Kyonggi-do, KR;
Jin-ho Park, Kyonggi-do, KR;
Kyeong-seob Moon, Kyonggi-do, KR;
Young-ho Seo, Kyonggi-do, KR;
Tae-hyung Lim, Kyonggi-do, KR;
Byung-mook Choi, Kyonggi-do, KR;
Ju-ho Kim, Kyonggi-do, KR;
Samsung Electronics, Co., Ltd., Suwon, KR;
Abstract
A plasma processing apparatus such as a plasma etching apparatus, which is not subject to arcing to the gas distributor plate which is caused by secondary potentials generated by polymers adhering to a gas distribution plate. The gas distribution plate is electrically isolated from the ground electric potential, and does not have any polarity. The gas distribution plate may be formed of an insulating material. Furthermore, a support plate may be adapted to fix the gas distribution plate to a chamber of the apparatus in such a manner that the gas distribution plate is detachably coupled with the support plate. Thereby, it is easier to separate the gas distribution plate from the apparatus to remove the accumulated polymers during the plasma process.