Gyeonggi, South Korea

Byung-mook Choi

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Byung-mook Choi. Retrieved from https://idiyas.com/inventor/byung-mook-choi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Byung-mook Choi in Plasma Processing Technology

Introduction

Byung-mook Choi, an accomplished inventor based in Kyonggi-do, South Korea, has made significant strides in the field of plasma processing technology. With his innovative approach, he has developed solutions that advance the capabilities of plasma etching apparatuses, addressing critical challenges to improve their efficiency and reliability.

Latest Patents

Choi holds one patent titled "Plasma processing apparatus protected from discharges in association." This invention focuses on improving plasma processing apparatuses, specifically addressing issues related to arcing on the gas distributor plate caused by secondary potentials from polymers. His design ensures that the gas distribution plate is electrically isolated from ground potential and void of polarity, enhancing safety and performance. Additionally, the gas distribution plate can be formed from insulating materials, facilitating easier maintenance and polymer removal during plasma processes.

Career Highlights

Byung-mook Choi is currently employed at Samsung Electronics Co., Ltd., where he leverages his expertise in plasma technology to contribute to innovative projects. His work emphasizes not only technical advancement but also practical applications that benefit the manufacturing processes within the electronics industry.

Collaborations

Throughout his career, Choi has collaborated with notable colleagues, including Chang-sik Kim and Jin-ho Park. Their collective efforts in research and development have propelled advances in plasma processing technologies, showcasing the power of teamwork in driving innovation.

Conclusion

With a patent that demonstrates his understanding of complex engineering challenges, Byung-mook Choi exemplifies the innovative spirit essential to the field of plasma technology. His contributions at Samsung Electronics Co., Ltd. and collaboration with talented peers reinforce the importance of research and innovation in developing effective solutions for modern technological challenges.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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