Youn-joon Sung

Title: Youn-joon Sung: Innovator in Substrate Etching Technologies

Introduction

Youn-joon Sung is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of substrate etching, particularly through his innovative methods that enhance the efficiency and precision of the process. With a total of two patents to his name, his work is recognized for its technical depth and practical applications.

Latest Patents

Youn-joon Sung's latest patents focus on a method of etching substrates using inductively coupled plasma reactive ion etching (ICP RIE). This method involves dicing substrates by forming a hard photo-resist pattern or metal mask pattern that defines scribe lines on a sapphire substrate or semiconductor epitaxial layer. The substrate is then etched along these scribe lines to create etched channels. An etching gas composed of BCl and/or BCl/Cl gas is utilized, with the option to add argon (Ar). This process produces stress lines through the substrate along the etched channels, allowing for precise dicing along these lines. Additionally, the thinning process involves subjecting the substrate surface to ICP RIE using similar etching gases, which is particularly effective for sapphire and other hard substrates.

Career Highlights

Throughout his career, Youn-joon Sung has worked with prominent companies such as Oriol Inc. and LG Electronics Inc. His experience in these organizations has contributed to his expertise in substrate etching technologies and has allowed him to develop innovative solutions that address industry challenges.

Collaborations

Youn-joon Sung has collaborated with notable professionals in his field, including Geun-Young Yeom and Myung Cheol Yoo. These collaborations have fostered a productive exchange of ideas and have further advanced the development of substrate etching techniques.

Conclusion

Youn-joon Sung stands out as an influential inventor in the realm of substrate etching technologies. His innovative methods and collaborative efforts have significantly impacted the industry, showcasing his dedication to advancing the field.