Tachikawa, Japan

Youichi Ogawa

This inventor holds 1 USPTO granted patent. Top assignee: Konica Minolta Advanced Layers, Inc.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Youichi Ogawa. Retrieved from https://idiyas.com/inventor/youichi-ogawa-6ppva3uc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Youichi Ogawa: Innovator in Eccentricity Measurement

Introduction

Youichi Ogawa is a notable inventor based in Tachikawa, Japan. He has made significant contributions to the field of optical measurement, particularly through his innovative patent related to eccentricity measurement.

Latest Patents

Ogawa holds a patent for an eccentricity measuring method. This method involves measuring a first position of a light source image formed by reflection at one optical surface and a predetermined second position related to another optical surface. The relative eccentricity between both optical surfaces is then calculated based on these measurements. This technique allows for the measurement of eccentricity using the same optical system, regardless of the radius of curvature of the optical surface of an optical element.

Career Highlights

Youichi Ogawa is currently employed at Konica Minolta Advanced Layers, Inc. His work focuses on advancing optical technologies and improving measurement techniques in the industry. His innovative approach has garnered attention and respect within the field.

Collaborations

Ogawa has collaborated with notable colleagues, including Masahiro Okitsu and Kazuyuki Ogura. These partnerships have contributed to the development of advanced optical measurement techniques.

Conclusion

Youichi Ogawa's contributions to the field of eccentricity measurement highlight his innovative spirit and dedication to advancing optical technologies. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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