This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: United Semiconductor (Xiamen) Co., Ltd.. Active years: 2022.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2022
Title: The Innovative Contributions of You Sheng Yin
Introduction
You Sheng Yin is a notable inventor based in Xiamen, China. He has made significant contributions to the field of chemical mechanical polishing through his innovative patent. His work is recognized for its impact on the efficiency and effectiveness of CMP machines.
Latest Patents
You Sheng Yin holds a patent for a CMP polishing system and associated pilot management system. This patent describes a dispatch management method for pilot-run on a computer, applicable to chemical mechanical polishing machines. The method includes generating initialization work schedules, filtering these schedules according to adaptability parameters, performing crossing operations to create crossed work schedules, and conducting mutation calculations to generate mutated work schedules. Additionally, optimization calculations are performed to create a target work schedule, which allows for automatic dispatch on CMP machines according to the target work schedule. This innovative approach enhances the operational efficiency of CMP processes.
Career Highlights
You Sheng Yin is currently employed at United Semiconductor (Xiamen) Co., Ltd. His role at the company allows him to apply his expertise in CMP technology and contribute to advancements in the semiconductor industry. His work is characterized by a commitment to innovation and excellence.
Collaborations
Some of his coworkers include Zhen Yu Sui and Wen Yi Tan. Their collaboration fosters a creative environment that encourages the development of new ideas and technologies in the field.
Conclusion
You Sheng Yin's contributions to the CMP polishing system demonstrate his innovative spirit and dedication to advancing technology. His patent reflects a significant step forward in the efficiency of chemical mechanical polishing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile