Yossi Simon

Title: Yossi Simon: Innovator in Optical Metrology

Introduction

Yossi Simon is a notable inventor based in Milpitas, California, recognized for his contributions to the field of optical metrology. With a total of three patents to his name, Simon has made significant advancements in metrology systems that enhance measurement accuracy and efficiency.

Latest Patents

One of Simon's latest patents is titled "Sensitive optical metrology in scanning and static modes." This innovative metrology system includes a tool that can perform measurements in both static and scanning modes. In static mode, metrology targets on a sample remain stationary during measurement, while in scanning mode, these targets are in motion. The system is equipped with a controller that directs the metrology tool based on the designated mode, generating precise metrology data for the sample.

Another significant patent is "System and method for determining target feature focus in image-based overlay metrology." This system utilizes through-focus imaging metrology sub-systems connected to a controller with processors that analyze training images captured at various focal positions. The processors generate a machine learning classifier to determine target focal positions based on selected features, enhancing the accuracy of overlay measurements.

Career Highlights

Yossi Simon is currently employed at Kla Corporation, a company known for its cutting-edge technology in the semiconductor industry. His work focuses on developing advanced metrology solutions that are crucial for the manufacturing of semiconductor devices.

Collaborations

Throughout his career, Simon has collaborated with esteemed colleagues, including Amnon Manassen and Andrew V Hill. These collaborations have contributed to the development of innovative technologies in the field of optical metrology.

Conclusion

Yossi Simon's contributions to optical metrology through his patents and work at Kla Corporation highlight his role as a significant innovator in the industry. His advancements continue to influence the accuracy and efficiency of metrology systems in semiconductor manufacturing.