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For the Inventor, By the Inventor

Nara, Japan

Yoshiyuki Nagahara

This inventor holds 7 USPTO granted patents. Top assignee: Sharp Kabushiki Kaisha Corporation. Active years: 1988-1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshiyuki Nagahara. Retrieved from https://idiyas.com/inventor/yoshiyuki-nagahara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 7

% Patents Active = 100.0

Average Co-Inventor Count = 5.7

ph-index = 5

Forward Citations = 94(Granted Patents)


Company Filing History:

goldMedal7 out of 25,982 
 
Sharp Kabushiki Kaisha Corporation
 patents

Years Active: 1988-1995

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7 patents (USPTO):Explore Patents
1. 5403683 - Photo-mask (1995-04-04),
2. 5260150 - Photo-mask with light shielding film buried in substrate (1993-11-09),
3. 5128922 - Optical disk with glass substrate and method of producing same (1992-07-07),
4. 5112727 - Method of and photomask for manufacturing optical memory element (1992-05-12),
5. 5079113 - Photo-mask (1992-01-07),
6. 4946730 - Method of and photomask for manufacturing optical memory element (1990-08-07),
7. 4737197 - Solar cell with metal paste contact (1988-04-12),

Title: The Innovative Contributions of Yoshiyuki Nagahara

Introduction: Yoshiyuki Nagahara is a prominent inventor based in Nara, Japan, known for his innovative work in the field of photo-mask technology. With a total of seven patents to his name, he has made significant strides in enhancing the functionality and efficiency of photo-masks used in various applications.

Latest Patents: Among his latest inventions, Nagahara has developed two noteworthy patents related to photo-masks. The first patent describes a photo-mask that consists of a light-permeable substrate along with multiple light-shielding films arranged on the substrate. These films create a specific mask pattern, while a protective light-permeable film shields the light-shielding films, ensuring their integrity. The second patent builds on this idea, introducing a photo-mask where the light-shielding films are embedded within the substrate itself. This innovative design further enhances the durability and performance of the photo-mask.

Career Highlights: Nagahara is currently affiliated with Sharp Corporation, a leading company in electronics and technology. His work at Sharp has allowed him to be at the forefront of innovations in photo-mask technology, significantly impacting the semiconductor and display industries.

Collaborations: Throughout his career, Nagahara has collaborated with notable colleagues such as Akira Shibata and Kenji Ohta. Together, their collective expertise and insights have contributed to advancing the field of photo-masks, ensuring the continuous enhancement of technology used in various manufacturing processes.

Conclusion: Yoshiyuki Nagahara's inventive contributions have significantly impacted the technology landscape, specifically through his advancements in photo-mask technology. With a dedicated career at Sharp Corporation and a growing portfolio of patents, Nagahara continues to be a key figure in the world of innovations and inventions, paving the way for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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