The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 1995
Filed:
Aug. 05, 1993
Applicant:
Inventors:
Kenji Ohta, Nara, JP;
Junji Hirokane, Nara, JP;
Akira Shibata, Nara, JP;
Yoshiyuki Nagahara, Nara, JP;
Kazuo Van, Nara, JP;
Michinobu Mieda, Nara, JP;
Tetsuya Inui, Nara, JP;
Assignee:
Sharp Kabushiki Kaisha, Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430321 ; 428203 ; 428209 ; 427164 ; 427595 ;
Abstract
A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.
Ohta, Kenji. (1995). Photo-mask (U.S. Patent No. 5403683). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5403683
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile