Ube, Japan

Yoshito Yuri

This inventor holds 1 USPTO granted patent. Top assignee: Nissan Chemical Industries Limited. Active years: 1993.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: Innovations of Yoshito Yuri in Silica Particle Technology

Introduction

Yoshito Yuri is a notable inventor based in Ube, Japan, recognized for his contributions to the field of silica particle technology. With a focus on enhancing the properties and production processes of silica particles, he has made significant strides in this area.

Latest Patents

Yoshito Yuri holds a patent for "Silica particles and process for producing the same." This invention involves silica particles characterized by an average particle size of 5 to 100 µm, a BET specific surface area of not more than 20 m²/g, and a pore volume of not more than 0.1 ml/g. Each particle features a surface with multiple protuberances that have a smooth configuration. The diameter at half the height of these protuberances ranges from 0.2 to 5.0 µm, while their height is between 0.2 to 4.0 µm. The process for producing these silica particles includes reacting hydrosilicofluoric acid, ammonium silicofluoride, or a mixture thereof with ammonia in an aqueous medium to form a silica slurry, followed by separation and calcination of the silica.

Career Highlights

Yoshito Yuri is currently employed at Nissan Chemical Industries Limited, where he continues to innovate and develop new technologies in the field of chemical engineering. His work has contributed to advancements in material science, particularly in the production of specialized silica particles.

Collaborations

Yoshito has collaborated with esteemed colleagues such as Yasushi Takako and Masao Kubo, enhancing the research and development efforts within his organization.

Conclusion

Yoshito Yuri's innovative work in silica particle technology exemplifies the impact of dedicated research and development in the chemical industry. His patent and ongoing contributions continue to influence advancements in material science.

Profile summary based on public USPTO records.
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