Yoshiteru Koseki

Title: Innovations of Yoshiteru Koseki

Introduction

Yoshiteru Koseki is a notable inventor based in Iwate-ken, Japan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative spirit and technical expertise.

Latest Patents

Koseki's latest patents include a "Solid state imaging device having a back surface impurity layer." This invention features a substrate with a solid state imaging element, a first impurity layer, multiple external electrodes, and a translucent substrate. The first impurity layer is strategically formed on the back surface of the substrate, creating a pn junction with the substrate. The external electrodes are connected to the solid state imaging element, enhancing the device's functionality.

Another significant patent is the "Semiconductor device and manufacturing method thereof." This patent outlines a manufacturing method for a semiconductor device that includes a substrate with first and second main surfaces, a through hole, a pad on the first main surface, and a through electrode. The method details the formation of an isolation region, the pad, and the through hole, ensuring efficient connectivity within the device.

Career Highlights

Yoshiteru Koseki is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work at Toshiba has allowed him to develop groundbreaking technologies that contribute to advancements in semiconductor devices.

Collaborations

Koseki has collaborated with notable coworkers, including Atsuko Kawasaki and Kenichiro Hagiwara. Their combined expertise has fostered an environment of innovation and creativity within their projects.

Conclusion

Yoshiteru Koseki's contributions to semiconductor technology through his patents reflect his dedication to innovation. His work continues to influence the industry and inspire future advancements in technology.