Toyooka-mura, Japan

Yoshitake Hana


Average Co-Inventor Count = 3.0

ph-index = 5

Forward Citations = 61(Granted Patents)


Location History:

  • Tokyo, JP (1998)
  • Shizuoka, JP (2001)
  • Toyooka-mura, JP (2000 - 2002)

Company Filing History:

goldMedal2 out of 217 
 
Dowa Mining Co., Ltd.
 patents
silverMedal1 out of 8,199 
 
Yazaki Corporation
 patents
bronzeMedal4 out of 832,718 
Other
 patents
where one patent can have more than one assignee

Years Active: 1998-2002

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6 patents (USPTO):Explore Patents

Title: Innovations of Yoshitake Hana

Introduction

Yoshitake Hana is a notable inventor based in Toyooka-mura, Japan. He has made significant contributions to the field of materials science, particularly in the development of wear-resistant copper base alloys. With a total of 6 patents to his name, his work has implications for various electrical applications.

Latest Patents

Hana's latest patents include a wear-resistant copper base alloy and a method for preparing it. This alloy features an oxide layer with a thickness of 10-1000 nm and an intermetallic compound layer primarily comprising Cu-Sn beneath the oxide film. The innovative method involves coating base material copper or a copper base alloy with Sn, followed by reflow treatment and heat treatment. This process results in a terminal made from the alloy that significantly reduces terminal-insertion force compared to ordinary copper base alloys. The wear-resistant copper or copper base alloy boasts enhanced surface hardness, excellent slipping properties, low contact resistance, and superior electrical characteristics, making it ideal for use in electrical parts such as connectors and charging sockets for electric vehicles.

Career Highlights

Throughout his career, Yoshitake Hana has worked with various companies, including Dowa Mining Co., Ltd. His expertise in materials science has allowed him to develop innovative solutions that address the challenges faced in electrical applications.

Collaborations

Hana has collaborated with notable colleagues such as Akira Sugawara and Takayoshi Endo. Their combined efforts have contributed to advancements in the field of materials science and electrical engineering.

Conclusion

Yoshitake Hana's contributions to the development of wear-resistant copper base alloys highlight his innovative spirit and dedication to improving electrical components. His patents reflect a commitment to enhancing the performance and reliability of materials used in modern technology.

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