This inventor holds 1 USPTO granted patent. Top assignee: Canon Anelva Corporation. Active years: 2021.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2021
Title: Innovations by Yoshitaka Ohtsuka
Introduction
Yoshitaka Ohtsuka is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the area of film formation methods.
Latest Patents
Ohtsuka holds a patent for a film formation method, vacuum processing apparatus, and methods related to semiconductor light emitting elements and electronic elements. His invention provides a film formation method and apparatus capable of fabricating an epitaxial film with +c polarity using a sputtering method. The process involves epitaxially growing a semiconductor thin film with a wurtzite structure on a heated substrate, ensuring precise control over the film formation.
Career Highlights
Ohtsuka is associated with Canon Anelva Corporation, where he has been instrumental in advancing semiconductor manufacturing technologies. His work has contributed to the development of innovative solutions in the semiconductor industry.
Collaborations
Ohtsuka has collaborated with notable colleagues such as Yoshiaki Daigo and Takuya Seino, enhancing the research and development efforts within his organization.
Conclusion
Yoshitaka Ohtsuka's contributions to semiconductor technology through his innovative patents highlight his role as a key inventor in the field. His work continues to influence advancements in semiconductor manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile