Machida, Japan

Yoshio Takatsu

This inventor holds 1 USPTO granted patent. Top assignee: Orc Manufacturing Co., Ltd.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshio Takatsu. Retrieved from https://idiyas.com/inventor/yoshio-takatsu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Yoshio Takatsu: Innovator in Exposure Device Technology

Introduction

Yoshio Takatsu is a notable inventor based in Machida, Japan. He has made significant contributions to the field of optical technology, particularly with his innovative exposure device. His work has implications for various applications in imaging and light modulation.

Latest Patents

Yoshio Takatsu holds a patent for an exposure device. This device includes an object stage for setting the object, at least one aperture member for splitting a light beam from an optical source into first and second light beams, and first and second spatial light modulators for modulating these beams. Additionally, it features first and second projection optical systems for irradiating the object, optical sensors for detecting light intensity, and a decision section for diagnosing the status of the light path.

Career Highlights

Yoshio Takatsu has been associated with Orc Manufacturing Co., Ltd., where he has furthered his research and development efforts. His work has led to advancements in exposure technology, enhancing the capabilities of optical devices.

Collaborations

Yoshio collaborates with Duk Lee, contributing to the innovative projects at Orc Manufacturing Co., Ltd. Their teamwork has been instrumental in pushing the boundaries of optical technology.

Conclusion

Yoshio Takatsu's contributions to the field of exposure devices highlight his innovative spirit and dedication to advancing optical technology. His patent reflects a significant step forward in the industry, showcasing his expertise and commitment to innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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