This inventor holds 1 USPTO granted patent. Top assignee: Canon Kabushiki Kaisha. Active years: 2002.
Company Filing History:
Years Active: 2002
Title: Innovations by Yoshio Seqi in Film Deposition Technology
Introduction
Yoshio Seqi is a notable inventor based in Shizuoka, Japan. He has made significant contributions to the field of film deposition technology, particularly through his innovative methods that enhance the quality of deposition films. His work is particularly relevant in industries that require high-quality film applications.
Latest Patents
Yoshio Seqi holds a patent for a method of cleaning a film deposition apparatus, as well as a method of dry etching a film deposition apparatus. This patent also includes an article production method that utilizes the cleaning or dry etching process. The method involves using a cleaning gas and high-frequency power to perform a cleaning process on a film deposition apparatus. This apparatus is designed for depositing a film on a substrate placed in a reactor chamber that can be evacuated to a low pressure. The innovative aspect of this method is that the supply of high-frequency power is temporarily stopped during the cleaning process, and the process is restarted by reapplying the high-frequency power. This technique effectively removes by-products from the reactor chamber, enabling the formation of high-quality deposition films, particularly for electrophotographic photosensitive drums. He has 1 patent to his name.
Career Highlights
Yoshio Seqi is associated with Canon Kabushiki Kaisha, a leading company in imaging and printing technologies. His work at Canon has allowed him to focus on advancing film deposition techniques, which are crucial for the production of high-quality imaging products.
Collaborations
Yoshio has collaborated with notable colleagues such as Hiroyuki Katagiri and Hideaki Matsuoka. Their combined expertise has contributed to the development of innovative solutions in the field of film deposition technology.
Conclusion
Yoshio Seqi's contributions to film deposition technology through his innovative methods have significantly impacted the industry. His patent reflects a commitment to enhancing the quality of deposition films, which is essential for various applications. His work continues to influence advancements in imaging technologies.