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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6453913 B1

PDFFull Text
Expired
Date of Patent:
Sep. 24, 2002

Filed:

Apr. 20, 2001

Method of cleaning a film deposition apparatus, method of dry etching a film deposition apparatus, and an article production method including a process based on the cleaning or dry etching method

Applicant:
Inventors:

Hiroyuki Katagiri, Shizuoka, JP;

Yoshio Seqi, Shizuoka, JP;

Hideaki Matsuoka, Shizuoka, JP;

Koji Hitsuishi, Shizuoka, JP;

Tetsuya Karaki, Shizuoka, JP;

Assignee:

Canon Kabushiki Kaisha, Tokyo, JP;

Attorney:

Fitzpatrick, Cella, Harper & Scinto

Primary Examiner:

Randy Gulakowski

Assistant Examiner:

M Kornakov

Int. Cl.
CPC ...
B08B 6/00 ;
U.S. Cl.
CPC ...
B08B 6/00 ;
Abstract

A method for performing a cleaning process uses a cleaning gas and high-frequency power upon a film deposition apparatus for depositing a film on a substrate placed in a reactor chamber which can be evacuated to a low pressure. Supplying of high-frequency power is temporarily stopped in the middle of the cleaning process, and the cleaning process is restarted by again supplying high-frequency power. This method is capable of effectively removing by-products from the inside of a reactor chamber and makes it possible to form a high-quality deposition film, in particular, a high-quality electrophotographic photosensitive drum.

Find Patent Forward Citations

Katagiri, Hiroyuki. (2002). Method of cleaning a film deposition apparatus, method of dry etching a film deposition apparatus, and an article production method including a process based on the cleaning or dry etching method (U.S. Patent No. 6453913). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6453913

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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