Shizuoka, Japan

Yoshio Onogawa


 

Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2012-2015

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4 patents (USPTO):Explore Patents

Title: Yoshio Onogawa: Innovator in Chemical Processes

Introduction

Yoshio Onogawa is a notable inventor based in Shizuoka, Japan. He has made significant contributions to the field of chemistry, particularly in the development of processes for producing various chemical compounds. With a total of 4 patents to his name, Onogawa's work has had a meaningful impact on industrial applications.

Latest Patents

Onogawa's latest patents include a method for producing 2-chloromethylbenzaldehyde and a method for producing a 2-(aryloxymethyl)benzaldehyde compound. The first patent describes a process that involves mixing 1-dichloromethyl-2-chloromethylbenzene with sulfuric acid and subsequently mixing the resulting mixture with water. This innovative approach allows for the high-yield production of an industrially useful 2-chloromethylbenzaldehyde-containing liquid composition. The second patent outlines a new process for producing a 2-(aryloxymethyl)benzaldehyde compound through hydrolysis and subsequent reactions, showcasing Onogawa's expertise in chemical synthesis.

Career Highlights

Yoshio Onogawa is currently associated with Sumitomo Chemical Company, Limited, where he continues to advance his research and development efforts. His work has not only contributed to the company's portfolio but has also enhanced the understanding of chemical processes in the industry.

Collaborations

Onogawa has collaborated with esteemed colleagues such as Masashi Takimoto and Tomonori Yamaoka. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Yoshio Onogawa stands out as a prominent figure in the field of chemical innovation. His patents and ongoing work at Sumitomo Chemical Company, Limited, reflect his commitment to advancing chemical processes and contributing to industrial applications.

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