Company Filing History:
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Years Active: 1989-2019
Title: Innovations of Yoshio Muto
Introduction
Yoshio Muto is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on improving manufacturing methods and enhancing the reliability of semiconductor devices.
Latest Patents
Muto's latest patents include a semiconductor device manufacturing method that involves applying a resist layer to a metal film on a semiconductor substrate. This method utilizes a positive photoresist that is sensitive to specific wavelengths of light. The resist layer is then exposed to light, developed, and used as a mask for wet etching the metal film. Another notable patent is for a semiconductor device and its production process, which aims to ensure low contact resistance and improve the long-term reliability of multilayered conductor wiring structures. This process includes etching an interlaminar insulating layer with a fluorine-based gas and removing a fluoride layer using a gas mixture in an ashing apparatus.
Career Highlights
Throughout his career, Yoshio Muto has worked with notable companies such as Copal Company Limited and Nippon Steel Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.
Collaborations
Muto has collaborated with several professionals in his field, including Mitsuo Takahashi and Koji Asako. These collaborations have likely enriched his work and led to advancements in semiconductor manufacturing techniques.
Conclusion
Yoshio Muto's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of semiconductor manufacturing.