The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2019
Filed:
Apr. 25, 2014
Applicant:
Mitsubishi Electric Corporation, Tokyo, JP;
Inventors:
Assignee:
Mitsubishi Electric Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/04 (2006.01); H01L 21/027 (2006.01); H01L 21/3213 (2006.01); H01L 21/67 (2006.01); H01L 29/40 (2006.01); H01L 29/66 (2006.01); H01L 29/872 (2006.01); H01L 29/06 (2006.01); H01L 29/16 (2006.01); H01L 29/78 (2006.01); H01L 29/739 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0495 (2013.01); H01L 21/027 (2013.01); H01L 21/0274 (2013.01); H01L 21/32134 (2013.01); H01L 21/32139 (2013.01); H01L 21/67086 (2013.01); H01L 21/67115 (2013.01); H01L 29/0615 (2013.01); H01L 29/0619 (2013.01); H01L 29/1608 (2013.01); H01L 29/401 (2013.01); H01L 29/6606 (2013.01); H01L 29/872 (2013.01); H01L 29/66712 (2013.01); H01L 29/7393 (2013.01); H01L 29/7811 (2013.01);
Abstract
A resist layer is applied to a metal film disposed on a semiconductor substrate, using a positive photoresist having photosensitivity to at least one wavelength. The resist layer is exposed to light including a region of the one wavelength. The exposed resist layer is developed. After the step of developing the resist layer, the metal film is subjected to wet etching with the resist layer used as a mask, in an etching apparatus. The etching apparatus is placed in an environment irradiated with a lighting apparatus that emits light with a wavelength equal to or shorter than the one wavelength cut off.