Company Filing History:
1 out of 10,341 
1 out of 832,880 Years Active: 2009
Title: Innovations of Yoshinori Kureishi
Introduction
Yoshinori Kureishi is a notable inventor based in Fuchu, Japan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor device that addresses critical manufacturing challenges.
Latest Patents
Kureishi holds 1 patent for a semiconductor device. The invention aims to facilitate the embedding of a copper (Cu) diffusion preventing film and a Cu film into fine patterns of high aspect ratios. This is achieved through a substrate processing method that involves three key steps. The first step includes processing a substrate with a first processing medium in a supercritical state. The second step involves forming a Cu diffusion preventing film using a second processing medium in a supercritical state. Finally, the third step entails forming a Cu film on the substrate with a third processing medium in a supercritical state.
Career Highlights
Throughout his career, Kureishi has worked with prominent companies, including Tokyo Electron Limited. His experience in the semiconductor industry has been instrumental in advancing manufacturing processes and technologies.
Collaborations
Kureishi has collaborated with notable professionals in his field, including Eiichi Kondoh and Vincent Vezin. These collaborations have contributed to the success of his innovative projects.
Conclusion
Yoshinori Kureishi's contributions to semiconductor technology exemplify the impact of innovation in manufacturing processes. His patent reflects a significant advancement in the field, showcasing his expertise and dedication to improving technology.