Tokyo, Japan

Yoshinori Isono

This inventor holds 1 USPTO granted patent. Top assignee: Ebara Corporation. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshinori Isono. Retrieved from https://idiyas.com/inventor/yoshinori-isono

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Yoshinori Isono: Innovator in Substrate Processing Technology

Introduction

Yoshinori Isono is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate processing technology. His innovative work has led to the development of a unique apparatus designed to detect abnormalities in substrates.

Latest Patents

Yoshinori Isono holds a patent for a substrate processing apparatus and method for detecting abnormalities in substrates. This invention includes a polishing unit for substrate refinement, a cleaning unit for post-polishing, and a detection unit that identifies issues such as cracks or chipping. The detection unit utilizes an imaging device to monitor the substrate's condition and compares the obtained signals against predetermined thresholds to ensure quality control.

Career Highlights

Isono's career is marked by his role at Ebara Corporation, where he has been instrumental in advancing substrate processing technologies. His expertise in this area has positioned him as a key figure in the industry, contributing to the development of efficient and reliable processing methods.

Collaborations

Yoshinori Isono has worked alongside notable colleagues, including Mitsunori Komatsu and Toru Maruyama. Their collaborative efforts have further enhanced the innovation and effectiveness of the technologies developed at Ebara Corporation.

Conclusion

Yoshinori Isono's contributions to substrate processing technology exemplify his commitment to innovation and quality. His patent reflects a significant advancement in the field, showcasing his ability to address critical challenges in substrate processing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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