Yoshimitsu Okuda

Title: Innovations of Yoshimitsu Okuda

Introduction

Yoshimitsu Okuda is a notable inventor based in Takatsuki, Japan. He has made significant contributions to the field of photoresist technology, particularly in the development of methods for forming resist patterns. His innovative approach has implications for various applications in electronics and materials science.

Latest Patents

Yoshimitsu Okuda holds a patent for a method of forming a resist pattern. This method involves exposing a novolak type positive photoresist to ultraviolet light in a specific pattern. It further includes irradiating the entire surface with far ultraviolet light, with a wavelength of 200 to 320 nm, in an atmosphere with an inert gas partial pressure ratio of 90% or more. The result is a resist pattern with a specific gradient of solubility that becomes higher from the surface toward the depthwise direction. This technique achieves a contrast value that is twice as high as conventional methods, allowing for the formation of high aspect ratio resist patterns.

Career Highlights

Yoshimitsu Okuda has been associated with Matsushita Electronics Corporation, where he has applied his expertise in photoresist technology. His work has contributed to advancements in the manufacturing processes of electronic components, enhancing the precision and efficiency of production.

Collaborations

Throughout his career, Okuda has collaborated with esteemed colleagues such as Morio Inoue and Yukio Takashima. These collaborations have fostered a productive environment for innovation and have led to further advancements in their respective fields.

Conclusion

Yoshimitsu Okuda's contributions to the field of photoresist technology exemplify the impact of innovative thinking in electronics. His patented method for forming resist patterns showcases the potential for enhanced manufacturing processes. His work continues to influence the industry and inspire future innovations.