Tokyo, Japan

Yoshimitsu Kodaira

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Anelva Corporation. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshimitsu Kodaira. Retrieved from https://idiyas.com/inventor/yoshimitsu-kodaira-hy6nc7p4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Innovations of Yoshimitsu Kodaira

Introduction

Yoshimitsu Kodaira is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the area of magnetic materials. His innovative approach has led to the development of a unique dry etching method that enhances the processing of magnetic materials.

Latest Patents

Kodaira holds a patent for a dry etching method for magnetic material. This method involves generating a plasma of an etching gas to dry-etch a magnetic material using a mask made of a non-organic material. The etching gas utilized in this process is an alcohol that contains at least one hydroxyl group. Specifically, the alcohols used include methanol, ethanol, and propanol, which are selected for their effectiveness in the etching process.

Career Highlights

Yoshimitsu Kodaira is associated with Anelva Corporation, where he applies his expertise in materials science. His work has been instrumental in advancing the technology related to magnetic materials, making significant strides in the industry.

Collaborations

Kodaira collaborates with Taichi Hiromi, a fellow innovator in the field. Their partnership has fostered a creative environment that encourages the development of new technologies and methods.

Conclusion

Yoshimitsu Kodaira's contributions to the field of magnetic materials through his innovative dry etching method exemplify the impact of dedicated inventors in advancing technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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