Yoshimichi Harada

Title: Innovations of Yoshimichi Harada

Introduction

Yoshimichi Harada is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving wiring structures and insulation properties in semiconductor devices.

Latest Patents

One of his latest patents is related to a wiring structure and method for manufacturing the same. This invention addresses the challenges of leakage current and insulation resistance in multi-layered wiring structures. By forming fine metal wiring in a porous insulation film, Harada's method ensures that there is no damage to the insulation properties between abutting wirings. Additionally, an insulation barrier layer is introduced to reduce leakage current and enhance insulation credibility.

Another notable patent involves a porous insulating film, which is crucial for semiconductor devices. This invention outlines a process for producing a porous insulating film that exhibits high adhesion to semiconductor materials. The method involves introducing gas containing organic silica compounds into plasma to grow the porous insulating film on a semiconductor substrate.

Career Highlights

Yoshimichi Harada has worked with notable companies such as NEC Corporation and NEC Electronics Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Some of his coworkers include Yoshihiro Hayashi and Munehiro Tada. Their collaboration has likely played a role in advancing the projects they have worked on together.

Conclusion

Yoshimichi Harada's contributions to semiconductor technology through his innovative patents demonstrate his commitment to enhancing the efficiency and reliability of electronic devices. His work continues to influence the field and pave the way for future advancements.