Utsunomiya, Japan

Yoshimi Takano

This inventor holds 1 USPTO granted patent. Top assignee: Canon Kabushiki Kaisha. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshimi Takano. Retrieved from https://idiyas.com/inventor/yoshimi-takano

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Yoshimi Takano: Inventor in Exposure Technology.

Introduction

Yoshimi Takano is an inventor associated with Utsunomiya, Japan, and Canon Kabushiki Kaisha. Her work includes an invention concerning exposure apparatus and the regulation of optical characteristics.

Latest Patents

Takano is credited with 1 patent: “Exposure apparatus, method of obtaining amount of regulation of object to be regulated, program, and method of manufacturing article.” The invention describes an exposure apparatus that projects light from a reticle onto a substrate. It includes a regulatable object and a device that adjusts the object’s position, attitude, or shape. A controller determines the adjustment amount needed to regulate an optical characteristic of the projection device, based on a weighted sum of wavefront aberration coefficients, and controls the regulating device accordingly.

Career Highlights

Takano’s listed patent is associated with Canon Kabushiki Kaisha and addresses precision control in exposure equipment. The patent also describes methods and a program for determining regulation amounts, as well as a method of manufacturing an article.

Collaborations

The provided information lists Youzou Fukagawa and Satoshi Kubo as Takano’s coworkers. Their names appear alongside her work associated with Canon Kabushiki Kaisha.

Conclusion

Yoshimi Takano’s patent reflects work on regulating optical characteristics in exposure apparatus, supporting precise projection and article manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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