Yoshikazu Sugiyasu

Title: Innovations of Yoshikazu Sugiyasu

Introduction

Yoshikazu Sugiyasu is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique apparatus that enhances the efficiency of plasma generation.

Latest Patents

One of Yoshikazu Sugiyasu's key patents is the "Capacitive Coupling Plasma Processing Apparatus." This invention features a process chamber designed to maintain a vacuum atmosphere, along with a process gas supply section that introduces a process gas into the chamber. Within the chamber, a first electrode and a second electrode are positioned opposite each other. An RF power supply is utilized to generate an RF electric field in the plasma generation region between the electrodes, effectively converting the process gas into plasma. The target substrate is supported by a member positioned between the electrodes, ensuring that the process target surface faces the second electrode. Additionally, a conductive functional surface is grounded and located around the plasma generation region to enhance plasma coupling.

Career Highlights

Yoshikazu Sugiyasu has worked with prominent companies in the technology sector, including Tokyo Electron Limited and Kabushiki Kaisha Toshiba. His experience in these organizations has allowed him to refine his expertise in plasma processing technologies.

Collaborations

Throughout his career, Yoshikazu has collaborated with esteemed colleagues such as Shinji Himori and Noriaki Imai. These partnerships have contributed to the advancement of his innovative projects.

Conclusion

Yoshikazu Sugiyasu's contributions to plasma processing technology exemplify his dedication to innovation. His patent for the capacitive coupling plasma processing apparatus showcases his ability to address complex challenges in the field. His work continues to influence advancements in technology and industry practices.