This inventor holds 2 USPTO granted patents. Top assignee: Sumco Corporation. Active years: 2009.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2009
Title: Innovations of Yoshikazu Shiina
Introduction
Yoshikazu Shiina is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the analysis and detection of impurities in silicon substrates. With a total of 2 patents to his name, his work has implications for improving the quality and reliability of silicon wafers used in various electronic applications.
Latest Patents
Yoshikazu Shiina's latest patents include a method for analyzing impurities and a method for detecting copper (Cu) concentration in silicon substrates. The method for analyzing impurities involves several steps, including immersing evaluation silicon wafers in a washing solution, dissolving surface and bulk portions of the wafers, and measuring impurity concentrations. This method aims to establish a calibration curve that correlates the concentrations of impurities in different layers of the silicon wafers.
The second patent, which focuses on detecting Cu concentration, provides a way to quantitatively estimate copper within a silicon substrate without fully dissolving it. This method involves heating the converse surface of the substrate and analyzing the Cu concentration at both surfaces, which is crucial for understanding process contamination.
Career Highlights
Yoshikazu Shiina is currently employed at Sumco Corporation, a leading company in the semiconductor industry. His work at Sumco has allowed him to apply his innovative methods to real-world challenges in silicon wafer production. His contributions have been instrumental in enhancing the quality control processes within the company.
Collaborations
Yoshikazu has collaborated with several professionals in his field, including Shabani B Mohammad and Mohammad B Shabani. These collaborations have fostered a productive environment for innovation and have led to advancements in semiconductor technology.
Conclusion
Yoshikazu Shiina's work exemplifies the importance of innovation in the semiconductor industry. His patents not only address critical issues related to impurity analysis but also enhance the understanding of material properties in silicon substrates. His contributions continue to influence the field and pave the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile