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For the Inventor, By the Inventor

Nara, Japan

Yoshihiro Yamamoto

This inventor holds 6 USPTO granted patents. Top assignee: Sharp Kabushiki Kaisha Corporation. Active years: 1987-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshihiro Yamamoto. Retrieved from https://idiyas.com/inventor/yoshihiro-yamamoto-0sttxa8f

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 6

% Patents Active = 83.3

Average Co-Inventor Count = 3.7

ph-index = 5

Forward Citations = 54(Granted Patents)


Company Filing History:

goldMedal6 out of 25,982 
 
Sharp Kabushiki Kaisha Corporation
 patents

Years Active: 1987-2007

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6 patents (USPTO):Explore Patents
1. 7253040 - Fabrication method of semiconductor device (2007-08-07),
2. 6130504 - Plasma addressing display device and method for producing the same (2000-10-10),
3. 6009828 - Method for forming a thin semiconductor film and a plasma CVD apparatus (2000-01-04),
4. 5675357 - Image display/input apparatus (1997-10-07),
5. 5618758 - Method for forming a thin semiconductor film and a plasma CVD apparatus (1997-04-08),
6. 4672148 - Thin-film solar cells (1987-06-09),

Title: Innovations of Yoshihiro Yamamoto

Introduction

Yoshihiro Yamamoto is a prominent inventor based in Nara, Japan. He has made significant contributions to the field of semiconductor devices and display technologies. With a total of 6 patents to his name, his work continues to influence advancements in these areas.

Latest Patents

Yamamoto's latest patents include a fabrication method of semiconductor devices. This method involves bonding an insulating substrate to a monocrystalline silicon substrate that contains a monocrystalline silicon thin film transistor and a hydrogen ion implanted portion. After depositing an amorphous silicon thin film, the film is modified into a polycrystalline silicon thin film through excimer laser irradiation. The laser beam's irradiation on the monocrystalline silicon thin film transistor is carefully managed to prevent damage during the process.

Another notable patent is for a plasma addressing display device and the method for producing it. This device consists of a plasma addressing substrate, a color filter substrate, and a display medium layer. The plasma addressing substrate features a dielectric sheet, multiple electrode lines, and partition walls, while the color filter substrate includes a color filter layer and strip electrodes. This innovative design allows for enhanced display capabilities.

Career Highlights

Yamamoto is currently employed at Sharp Kabushiki Kaisha Corporation, where he continues to develop cutting-edge technologies. His work has been instrumental in advancing the capabilities of semiconductor devices and display technologies.

Collaborations

Yamamoto has collaborated with notable coworkers, including Takashi Tomita and Katsuhiko Nomoto. Their combined expertise has contributed to the successful development of innovative technologies in their field.

Conclusion

Yoshihiro Yamamoto's contributions to semiconductor devices and display technologies highlight his role as a leading inventor. His innovative patents and collaborations continue to shape the future of these industries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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